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Ultrashort Pulse Laser TCO Structuring

Non-contact laser ablation is an enabling technology for the selective removal of the TCO surface layer for photovoltaics based on black silicon. Ultrashort laser pulses with their extremely high peak powers and short interaction times offer the advantage of high precision together with limited damage in the surrounding material. The energy transfer to the material can be adapted according to the laser parameters, like pulse duration, pulse energy and wavelength. Typical line widths for isolation are in the size of 20 to 50 µm. The dead zone can be minimized compared to conventional techniques and the overall module efficiency is increased. Therefore, ultrashort laser pulses are an ideal tool for TCO structuring for solar cell interconnection.

Startseite UNI Jena

funded by


BMBF
Unternehmen-Region
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